Invention Grant
- Patent Title: Method of manufacturing a shapeable short-resistant capacitor
- Patent Title (中): 制造可成形短路电容器的方法
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Application No.: US12498025Application Date: 2009-07-06
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Publication No.: US08407871B2Publication Date: 2013-04-02
- Inventor: Ralph S. Taylor , John D. Myers , William J. Baney
- Applicant: Ralph S. Taylor , John D. Myers , William J. Baney
- Applicant Address: US MI Troy
- Assignee: Delphi Technologies, Inc.
- Current Assignee: Delphi Technologies, Inc.
- Current Assignee Address: US MI Troy
- Agent Thomas N. Twomey
- Main IPC: H01G4/018
- IPC: H01G4/018 ; H05K3/10

Abstract:
A method that employs a novel combination of conventional fabrication techniques provides a ceramic short-resistant capacitor that is bendable and/or shapeable to provide a multiple layer capacitor that is extremely compact and amenable to desirable geometries. The method allows thinner and more flexible ceramic capacitors to be made. The method includes forming a first thin metal layer on a substrate; depositing a thin, ceramic dielectric layer over the metal layer; depositing a second thin metal layer over the dielectric layer to form a capacitor exhibiting a benign failure mode; and separating the capacitor from the substrate. The method may also include bending the resulting capacitor into a serpentine arrangement with gaps between the layers that allow venting of evaporated electrode material in the event of a benign failure.
Public/Granted literature
- US20110002081A1 SHAPEABLE SHORT-RESISTANT CAPACITOR Public/Granted day:2011-01-06
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