发明授权
- 专利标题: Conformal shielding process using flush structures
- 专利标题(中): 使用齐平结构的保形屏蔽工艺
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申请号: US11952592申请日: 2007-12-07
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公开(公告)号: US08409658B2公开(公告)日: 2013-04-02
- 发明人: David J. Hiner , Waite R. Warren, Jr. , David Jandzinski
- 申请人: David J. Hiner , Waite R. Warren, Jr. , David Jandzinski
- 申请人地址: US NC Greensboro
- 专利权人: RF Micro Devices, Inc.
- 当前专利权人: RF Micro Devices, Inc.
- 当前专利权人地址: US NC Greensboro
- 代理机构: Withrow & Terranova, P.L.L.C.
- 主分类号: B05D5/12
- IPC分类号: B05D5/12
摘要:
In one embodiment, a meta-module having circuitry for two or more modules is formed on a substrate, which is preferably a laminated substrate. The circuitry for the different modules is initially formed on the single meta-module. Each module will have one or more component areas in which the circuitry is formed. A metallic structure is formed on or in the substrate for each component area to be shielded. A single body, such as an overmold body, is then formed over all of the modules on the meta-module. At least a portion of the metallic structure for each component area to be shielded is then exposed through the body by a cutting, drilling, or like operation. Next, an electromagnetic shield material is applied to the exterior surface of the body of each of the component areas to be shielded and in contact with the exposed portion of the metallic structures.
公开/授权文献
- US20090000816A1 CONFORMAL SHIELDING PROCESS USING FLUSH STRUCTURES 公开/授权日:2009-01-01
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