发明授权
- 专利标题： Preparation process of microbeads, and microbeads
- 专利标题（中）： 微珠和微珠的制备过程
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申请号： US12432108申请日： 2009-04-29
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公开(公告)号： US08409706B2公开(公告)日： 2013-04-02
- 发明人: Kenzo Machida , Noriyuki Kishii , Mari Ichimura , Masanobu Tanaka
- 申请人： Kenzo Machida , Noriyuki Kishii , Mari Ichimura , Masanobu Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Sony Corporation
- 当前专利权人： Sony Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： K&L Gates, LLP
- 优先权： JP2008-120121 20080502; JP2008-209147 20080815
- 主分类号： B32B1/00
- IPC分类号： B32B1/00 ; G03F7/20
摘要：
The present application provides a process for the preparation of microbeads, including the steps of: patterning a thin film, which has been formed on a substrate, into microbead regions of at least one predetermined shape by photolithography; immobilizing a predetermined substance on the thus-patterned microbead regions; and stripping off, from the substrate, the thus-patterned microbead regions with the substance immobilized thereon.
公开/授权文献
- US20090274908A1 PREPARATION PROCESS OF MICROBEADS, AND MICROBEADS 公开/授权日：2009-11-05
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