发明授权
- 专利标题: Ablation of film stacks in solar cell fabrication processes
- 专利标题(中): 在太阳能电池制造工艺中消除薄膜叠层
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申请号: US13486095申请日: 2012-06-01
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公开(公告)号: US08409902B1公开(公告)日: 2013-04-02
- 发明人: Gabriel Harley , Taeseok Kim , Peter John Cousins
- 申请人: Gabriel Harley , Taeseok Kim , Peter John Cousins
- 申请人地址: US CA San Jose
- 专利权人: SunPower Corporation
- 当前专利权人: SunPower Corporation
- 当前专利权人地址: US CA San Jose
- 代理机构: Okamoto & Benedicto LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A dielectric film stack of a solar cell is ablated using a laser. The dielectric film stack includes a layer that is absorptive in a wavelength of operation of the laser source. The laser source, which fires laser pulses at a pulse repetition rate, is configured to ablate the film stack to expose an underlying layer of material. The laser source may be configured to fire a burst of two laser pulses or a single temporally asymmetric laser pulse within a single pulse repetition to achieve complete ablation in a single step.
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