发明授权
- 专利标题: Method and apparatus for inspecting defects
- 专利标题(中): 检查缺陷的方法和装置
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申请号: US12504972申请日: 2009-07-17
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公开(公告)号: US08411264B2公开(公告)日: 2013-04-02
- 发明人: Takeo Ueno , Hiroyuki Nakano , Yasuhiro Yoshitake
- 申请人: Takeo Ueno , Hiroyuki Nakano , Yasuhiro Yoshitake
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2008-186651 20080718
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
An apparatus for inspecting a substrate surface is provided, which includes illumination optics for irradiating the substrate surface linearly with rectilinearly polarized light from an oblique direction, detection optics for acquiring images of the substrate surface, each of the images being formed by the light scattered from the light-irradiated substrate surface, and means for comparing an image selected as an inspection image from the plurality of substrate surface images that the detection optics has acquired to detect defects, and another image selected from the plural images of the substrate surface as a reference image different from the inspection image; the illumination optics being formed with polarization control means for controlling a polarizing direction of the light according to a particular scanning direction of the substrate or a direction orthogonal to the scanning direction.
公开/授权文献
- US20100014083A1 Method and Apparatus for Inspecting Defects 公开/授权日:2010-01-21
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