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发明授权
US08420289B2 Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods 有权
含芳环的聚合物，聚合物混合物，抗反射硬掩模组​​合物及相关方法

Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods
摘要：
An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.
摘要（中）：

含芳环的聚合物，聚合物混合物，抗反射硬掩模组​​合物和用于在基材上图案化材料的方法，所述含芳族环的聚合物包括至少一种由式1,2所示的含芳族环的聚合物或 3。

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