发明授权
US08420296B2 Photoresist composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same
有权
用于滤色器保护层的光致抗蚀剂组合物，包括其的滤色器保护层和包括其的图像传感器
- 专利标题： Photoresist composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same
- 专利标题（中）： 用于滤色器保护层的光致抗蚀剂组合物，包括其的滤色器保护层和包括其的图像传感器
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申请号： US12868975申请日： 2010-08-26
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公开(公告)号： US08420296B2公开(公告)日： 2013-04-16
- 发明人: Jae-Hyun Kim , Se-Young Choi , Nam-Gwang Kim , Eui-June Jeong , Chang-Min Lee
- 申请人： Jae-Hyun Kim , Se-Young Choi , Nam-Gwang Kim , Eui-June Jeong , Chang-Min Lee
- 申请人地址： KR Gumi-si
- 专利权人： Cheil Industries Inc.
- 当前专利权人： Cheil Industries Inc.
- 当前专利权人地址： KR Gumi-si
- 代理机构： Summa, Additon & Ashe, P.A.
- 优先权： KR10-2009-0132216 20091228
- 主分类号： G03C1/00
- IPC分类号： G03C1/00 ; G03C7/00 ; C08F2/50 ; C08J3/28
摘要：
Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
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