发明授权
- 专利标题： Forming method of resist pattern and manufacturing method of thin-film magnetic head
- 专利标题（中）： 抗蚀剂图案的形成方法和薄膜磁头的制造方法
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申请号： US12187128申请日： 2008-08-06
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公开(公告)号： US08420299B2公开(公告)日： 2013-04-16
- 发明人: Hisayoshi Watanabe , Susumu Aoki
- 申请人： Hisayoshi Watanabe , Susumu Aoki
- 申请人地址： JP Tokyo
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Frommer Lawrence & Haug LLP
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
摘要：
It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more.A forming method for a resist pattern to reduce a resist residue on a step is provided, the method comprising: forming resist film with coating resist containing photo-acid-generator on a step formed on a substrate, where gradient angle of the step is equal to 90 degrees or more, exposing said resist film and generating acid from said photo-acid-generator.
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