发明授权
- 专利标题: Schottky diode with high antistatic capability
- 专利标题(中): 具有高抗静电能力的肖特基二极管
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申请号: US13186494申请日: 2011-07-20
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公开(公告)号: US08421179B2公开(公告)日: 2013-04-16
- 发明人: Chiun-Yen Tung , Kun-Hsien Chen , Kai-Ying Wang , Wen-Li Tsai
- 申请人: Chiun-Yen Tung , Kun-Hsien Chen , Kai-Ying Wang , Wen-Li Tsai
- 申请人地址: TW Kaohsiung
- 专利权人: Pynmax Technology Co., Ltd.
- 当前专利权人: Pynmax Technology Co., Ltd.
- 当前专利权人地址: TW Kaohsiung
- 代理机构: Patenttm.us
- 优先权: TW100202614U 20110211
- 主分类号: H01L29/872
- IPC分类号: H01L29/872
摘要:
A Schottky diode with high antistatic capability has an N− type doped drift layer formed on an N+ type doped layer. The N− type doped drift layer has a surface formed with a protection ring. Inside the protection ring is a P-type doped area. The N− type doped drift layer surface is further formed with an oxide layer and a metal layer. The contact region between the metal layer and the N− type doped drift layer and the P-type doped area forms a Schottky contact. The P-type doped area has a low-concentration lower layer and a high-concentration upper layer, so that the surface ion concentration is high in the P-type doped area. The Schottky diode thus has such advantages of lowered forward voltage drop and high antistatic capability.
公开/授权文献
- US20120205770A1 SCHOTTKY DIODE WITH HIGH ANTISTATIC CAPABILITY 公开/授权日:2012-08-16
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