发明授权
- 专利标题: Process and device for cleaning and etching a substrate with a transparent conductive oxide layer
- 专利标题(中): 用透明导电氧化物层清洗和蚀刻衬底的工艺和装置
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申请号: US11547869申请日: 2005-03-31
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公开(公告)号: US08425793B2公开(公告)日: 2013-04-23
- 发明人: Joachim Müller , Gunnar Schöpe , Hildegard Siekmann , Bernd Rech , Tobias Repmann , Wolfgang Apenzeller , Brigitte Sehrbrock
- 申请人: Joachim Müller , Gunnar Schöpe , Hildegard Siekmann , Bernd Rech , Tobias Repmann , Wolfgang Apenzeller , Brigitte Sehrbrock
- 专利权人: Forschungszentrum Juelich GmbH
- 当前专利权人: Forschungszentrum Juelich GmbH
- 代理商 Andrew Wilford
- 优先权: DE102004017680 20040410
- 国际申请: PCT/DE2005/000563 WO 20050331
- 国际公布: WO2005/101522 WO 20051027
- 主分类号: C03C15/00
- IPC分类号: C03C15/00
摘要:
A simple process is disclosed for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed through a device. The process is technically simple to implement and makes it possible to regularly and homogeneously roughen and texturize ZnO layers of up to 1 m2. The device for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports has for that purpose a first means for treating the substrate with an etching liquid, a second means for treating the substrate with a cleaning liquid, and another means, in particular transport rollers, for conveying the substrate from the first to the second means.
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