发明授权
- 专利标题： Radiation source and lithographic apparatus
- 专利标题（中）： 辐射源和光刻设备
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申请号： US12611269申请日： 2009-11-03
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公开(公告)号： US08431916B2公开(公告)日： 2013-04-30
- 发明人: Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
- 申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a collector arranged to collect EUV radiation emitted by the plasma. The optics are arranged such that in use the fuel vaporizing and exciting radiation is incident upon more than one side of the fuel droplet at the interaction point.
公开/授权文献
- US20100110405A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 公开/授权日：2010-05-06