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    Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device
    1.
    发明授权
    Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device 有权
    辐射源，控制辐射源的方法，光刻设备及其制造方法

    公开(公告)号：US08663881B2

    公开(公告)日：2014-03-04

    申请号：US13554725

    申请日：2012-07-20

    申请人： Erik Petrus Buurman ,  Szilard Istvan Csiszar

    发明人： Erik Petrus Buurman ,  Szilard Istvan Csiszar

    IPC分类号： G03C5/00

    CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70133 ,  H05G2/008

    摘要： A lithographic apparatus includes an illuminator for receiving a beam of EUV radiation from a radiation source apparatus and for conditioning the beam to illuminate a target area of a patterning device, such as a reticle. The reticle forms a patterned radiation beam. A projection system transfers the pattern from said patterning device to a substrate by EUV lithography. Sensors are provided for detecting a residual asymmetry in the conditioned beam as the beam approaches the reticle, particularly in a non-scanning direction. A feedback control signal is generated to adjust a parameter of said radiation source in response to detected asymmetry. The feedback is based on a ratio of intensities measured by two sensors at opposite ends of an illumination slit, and adjusts the timing of laser pulses generating an EUV-emitting plasma.

    摘要翻译： 光刻设备包括用于接收来自辐射源设备的EUV辐射束的照明器，并且用于调节光束照射诸如光罩之类的图案形成装置的目标区域。 掩模版形成图案化的辐射束。 投影系统通过EUV光刻将图案从所述图案形成装置传送到基板。 提供传感器，用于当光束接近光罩时，特别是在非扫描方向上，用于检测调节光束中的残余不对称性。 产生反馈控制信号以响应于检测到的不对称来调整所述辐射源的参数。 反馈基于由照明狭缝的相对端处的两个传感器测量的强度比，并且调整产生EUV发射等离子体的激光脉冲的定时。

    RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE
    2.
    发明申请
    RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
    辐射源，控制辐射源的方法，光刻设备及其制造方法

    公开(公告)号：US20110273691A1

    公开(公告)日：2011-11-10

    申请号：US13101795

    申请日：2011-05-05

    申请人： Erik Petrus BUURMAN ,  Nicolaas Antonius Allegondu Johannes VAN ASTEN ,  Hermanus Johannes Maria KREUWEL

    发明人： Erik Petrus BUURMAN ,  Nicolaas Antonius Allegondu Johannes VAN ASTEN ,  Hermanus Johannes Maria KREUWEL

    IPC分类号： G03B27/54 ,  H05G2/00

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/008

    摘要： An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By exploiting the photoacoustic effect, the monitoring is accomplished in a non-intrusive manner using acoustic sensors coupled to material of a cone which surrounds the exit aperture. Different angular positions of the radiation beam can be deduced by discriminating signals from the different sensors on the basis of relative arrival time or phase, and/or by comparing the amplitude/intensity of the signals. A sequencer function can be used to introduce a sequence of deliberate offsets in the beam position. This allows acoustic signals to be generated and detected for measurement purposes, when the beam would otherwise not impinge on the material.

    摘要翻译： 等离子体形式的EUV辐射源聚焦在虚拟源点，以便通过EUV光刻设备中的源极收集器模块的出口孔。 使用监控信号，在三个方向控制等离子位置X，Y和Z。 通过利用光声效应，使用耦合到围绕出射孔的锥体的材料的声学传感器以非侵入式的方式实现监视。 可以通过基于相对到达时间或相位来区分来自不同传感器的信号和/或通过比较信号的幅度/强度来推导辐射束的不同角位置。 定序器功能可用于在光束位置中引入有序偏移序列。 这样当波束否则不会碰撞在材料上时，可以产生和检测声信号用于测量目的。

    Increasing pulse-to-pulse radiation beam uniformity
    3.
    发明申请
    Increasing pulse-to-pulse radiation beam uniformity 有权
    增加脉冲到脉冲的辐射束均匀性

    公开(公告)号：US20080111982A1

    公开(公告)日：2008-05-15

    申请号：US11598834

    申请日：2006-11-14

    申请人： Oscar Franciscus Jozephus Noordman ,  Erik Petrus Buurman

    发明人： Oscar Franciscus Jozephus Noordman ,  Erik Petrus Buurman

    IPC分类号： G03B27/72

    CPC分类号： G03B27/72 ,  G03F7/70041

    摘要： A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.

    摘要翻译： 一种系统用于大幅减少在主和功率振荡器之间传播的光束的发散度，例如在激光束源中。 该系统包括第一和第二振荡器和光束调节装置。 第一振荡器被配置为产生辐射束。 光束调节装置被配置为稳定辐射束的位置，方向，尺寸或发散度以产生调节光束。 第二振荡器被配置为放大经调节的波束以产生放大的波束。

    Laser device
    5.
    发明授权
    Laser device 有权
    激光设备

    公开(公告)号：US08462826B2

    公开(公告)日：2013-06-11

    申请号：US12683612

    申请日：2010-01-07

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

    IPC分类号： H01S3/00

    CPC分类号： G21K1/025 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/001

    摘要： A laser device includes a seed laser, an amplifier, a detector, and an optical element arranged to direct radiation emitted by the seed laser towards a plasma generation site. The optical element is arranged to direct towards the detector amplified spontaneous emission radiation which has been emitted by the seed laser and has been reflected from a droplet of fuel material. The detector is arranged to trigger generation of a laser radiation pulse by the seed laser when the reflected amplified spontaneous emission radiation is detected.

    摘要翻译： 激光装置包括种子激光器，放大器，检测器和布置成将种子激光器发射的辐射引导到等离子体产生部位的光学元件。 光学元件被布置成朝着检测器引导已经由种子激光器发射并且已经从燃料材料液滴反射的放射自发辐射。 检测器被布置成当检测到反射的放大的自发发射辐射时，通过种子激光器触发激光辐射脉冲的产生。

    EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    7.
    发明申请
    EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    EUV辐射源和光刻设备

    公开(公告)号：US20120280148A1

    公开(公告)日：2012-11-08

    申请号：US13520982

    申请日：2010-11-30

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Wilbert Jan Mestrom

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Wilbert Jan Mestrom

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/006 ,  H05G2/008

    摘要： An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.

    摘要翻译： EUV辐射源，其包括配置成向等离子体形成位置供应燃料的燃料供应。 燃料供应包括储存器，其构造成将燃料保持在足够高的温度以将燃料保持为液体形式;以及压力容器，其构造成容纳储存器，压力容器至少部分地与储存器热隔离。 EUV辐射源还包括被配置为照射由等离子​​体形成位置处的燃料供应供应的燃料的激光辐射源。

    LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    光刻设备，EUV辐射发生装置和装置制造方法

    公开(公告)号：US20130141709A1

    公开(公告)日：2013-06-06

    申请号：US13817792

    申请日：2011-08-04

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Uwe Bruno Heini Stamm

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Uwe Bruno Heini Stamm

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70033 ,  B23K26/0643 ,  G03F7/70025 ,  G03F7/70191 ,  G03F7/7055 ,  H01S3/0071 ,  H01S3/2308 ,  H05G2/001 ,  H05G2/008

    摘要： An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.

    摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射脉冲的激光器，以及包括可旋转地安装的反射器和径向定位的反射器的光隔离装置。 可旋转地安装的反射器和激光器是同步的，使得当光隔离装置接收到激光辐射脉冲以允许激光辐射脉冲传递到一个激光辐射脉冲时，可旋转安装的反射器的反射表面与径向定位的反射器光学连通 等离子体形成位置并且通过燃料材料液滴的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光学隔离装置接收从等离子体形成位置反射的辐射时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。