Invention Grant
- Patent Title: Alignment for edge field nano-imprinting
- Patent Title (中): 边缘场纳米压印的对准
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Application No.: US12606274Application Date: 2009-10-27
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Publication No.: US08432548B2Publication Date: 2013-04-30
- Inventor: Byung-Jin Choi , Pawan Kumar Nimmakayala , Philip D. Schumaker
- Applicant: Byung-Jin Choi , Pawan Kumar Nimmakayala , Philip D. Schumaker
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: G01B11/00
- IPC: G01B11/00 ; B41F1/34 ; B41F21/12 ; B41F21/14 ; B41L1/02 ; B41L3/02
Abstract:
Systems and methods for alignment of template and substrate at the edge of substrate are described.
Public/Granted literature
- US20100110434A1 Alignment for Edge Field Nano-Imprinting Public/Granted day:2010-05-06
Information query
