发明授权
- 专利标题: Increasing an electrical resistance of a resistor by oxidation
- 专利标题(中): 通过氧化增加电阻的电阻
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申请号: US11968686申请日: 2008-01-03
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公开(公告)号: US08440522B2公开(公告)日: 2013-05-14
- 发明人: Arne W. Ballantine , Daniel C. Edelstein , Anthony K. Stamper
- 申请人: Arne W. Ballantine , Daniel C. Edelstein , Anthony K. Stamper
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Schmeiser, Olsen & Watts
- 代理商 Anthony Canale
- 主分类号: H01L21/8234
- IPC分类号: H01L21/8234 ; H01L21/20
摘要:
A method for increasing an electrical resistance of a resistor that is within a semiconductor structure. A fraction of a surface layer of the resistor is oxidized with oxygen particles. In an embodiment, the fraction of the surface layer is heated by a beam of particles, such that the semiconductor structure is within a chamber that includes the oxygen particles as gaseous oxygen-comprising molecules. In an embodiment, the semiconductor structure is immersed in a chemical solution which includes the oxygen particles, wherein the oxygen particles includes oxygen-comprising liquid molecules, oxygen ions, or an oxygen-comprising gas dissolved in the chemical solution under pressurization. In an embodiment, the resistor is tested to determine whether the electrical resistance of the resistor after being oxidized with the oxygen particles is within a tolerance of a predetermined target resistance.
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