发明授权
- 专利标题: Method for producing a multilayer coating, optical element and optical arrangement
- 专利标题(中): 制造多层涂层,光学元件和光学布置的方法
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申请号: US12965280申请日: 2010-12-10
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公开(公告)号: US08457281B2公开(公告)日: 2013-06-04
- 发明人: Hartmut Enkisch , Stephan Muellender , Martin Endres
- 申请人: Hartmut Enkisch , Stephan Muellender , Martin Endres
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Sughrue Mion, PLLC
- 优先权: DE102008002403 20080612
- 主分类号: G21K1/06
- IPC分类号: G21K1/06
摘要:
A method for producing a multilayer coating (17) for reflecting radiation in the soft X-ray or EUV wavelength range on an optical element (8, 9) operated at an operating temperature (TOP) of 30° C. or more, including: determining an optical design for the multilayer coating (17) which defines an optical desired layer thickness (nOP dOP) of the layers (17.1, 17.2) of the multilayer coating (17) at the operating temperature (TOP), and applying the layers (17.1, 17.2) of the multilayer coating (17) with an optical actual layer thickness (nB dB) chosen such that a layer thickness change(nOP dOP−nB dB) caused by thermal expansion of the layers (17.1, 17.2) between the coating temperature (TB) and the operating temperature (TOP) is compensated for. Also provided are an associated optical element (8, 9) and a projection exposure apparatus having at least one such optical element (8, 9).
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