发明授权
US08461556B2 Using beam blockers to perform a patterned implant of a workpiece
有权
使用光束阻挡器来执行工件的图案化植入
- 专利标题： Using beam blockers to perform a patterned implant of a workpiece
- 专利标题（中）： 使用光束阻挡器来执行工件的图案化植入
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申请号： US12877666申请日： 2010-09-08
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公开(公告)号： US08461556B2公开(公告)日： 2013-06-11
- 发明人: Daniel Distaso , Russell J. Low
- 申请人： Daniel Distaso , Russell J. Low
- 申请人地址： US MA Gloucester
- 专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址： US MA Gloucester
- 主分类号： G21K5/10
- IPC分类号： G21K5/10
摘要：
Blockers in an ion beam blocker unit selectively block or trim an ion beam. In one instance, the ion beam has first current regions and second current regions. These current regions may be unequal. The ion beam is then implanted into a workpiece to form regions with different doses. The workpiece may be scanned so that the entirety of its surface is implanted.
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