发明授权
US08461560B2 LPP EUV light source drive laser system 有权
LPP EUV光源驱动激光系统

LPP EUV light source drive laser system
摘要:
An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
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