发明授权
- 专利标题: Solid-state imaging device and electronic imaging device having multi-stage element isolation layer
- 专利标题(中): 具有多级元件隔离层的固态成像装置和电子成像装置
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申请号: US12822652申请日: 2010-06-24
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公开(公告)号: US08462239B2公开(公告)日: 2013-06-11
- 发明人: Kaoru Fujisawa , Tetsuya Iizuka , Kimihiko Sato
- 申请人: Kaoru Fujisawa , Tetsuya Iizuka , Kimihiko Sato
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-162718 20090709
- 主分类号: H04N3/14
- IPC分类号: H04N3/14 ; H04N5/335
摘要:
A solid-state imaging device and an electronic device that includes the solid-state imaging device prevents shifting of a photoelectric conversion region due to long-wavelength light passing to subsurface portions of the solid-state imagine device. The device include a photo diode having an upper layer of a first conductivity type formed over a second layer having an accumulation region of a second conductivity type. The upper layer is a light-receiving portion of the photodiode. A multi-stage element isolation layer is included and has a plurality of layers of the first conductivity type, such that a first lateral side of a first stage of the multi-stage layer abuts the accumulation portion, and a second stage of the multi-stage layer is separated by a width W from the accumulation region of an intermediate portion of a second conductivity type.
公开/授权文献
- US20110007194A1 SOLID-STATE IMAGING DEVICE AND ELECTRONIC DEVICE 公开/授权日:2011-01-13
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