- 专利标题: Substrate with embedded patterned capacitance
-
申请号: US12180768申请日: 2008-07-28
-
公开(公告)号: US08470680B2公开(公告)日: 2013-06-25
- 发明人: John D. Prymak , Chris Stolarski , Alethia Melody , Antony P. Chacko , Gregory J. Dunn
- 申请人: John D. Prymak , Chris Stolarski , Alethia Melody , Antony P. Chacko , Gregory J. Dunn
- 申请人地址: US SC Simpsonville US IL Schaumburg
- 专利权人: Kemet Electronics Corporation,Motorola, Inc.
- 当前专利权人: Kemet Electronics Corporation,Motorola, Inc.
- 当前专利权人地址: US SC Simpsonville US IL Schaumburg
- 代理机构: Perkins Law Firm, LLC
- 代理商 Joseph T. Guy
- 主分类号: H01G4/005
- IPC分类号: H01G4/005
摘要:
A process for forming a laminate with capacitance and the laminate formed thereby. The process includes the steps of providing a substrate and laminating a conductive foil on the substrate wherein the foil has a dielectric. A conductive layer is formed on the dielectric. The conductive foil is treated to electrically isolate a region of conductive foil containing the conductive layer from additional conductive foil. A cathodic conductive couple is made between the conductive layer and a cathode trace and an anodic conductive couple is made between the conductive foil and an anode trace.
公开/授权文献
- US20100020473A1 SUBSTRATE WITH EMBEDDED PATTERNED CAPACITANCE 公开/授权日:2010-01-28
信息查询