Invention Grant
- Patent Title: Substrate with embedded patterned capacitance
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Application No.: US12180768Application Date: 2008-07-28
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Publication No.: US08470680B2Publication Date: 2013-06-25
- Inventor: John D. Prymak , Chris Stolarski , Alethia Melody , Antony P. Chacko , Gregory J. Dunn
- Applicant: John D. Prymak , Chris Stolarski , Alethia Melody , Antony P. Chacko , Gregory J. Dunn
- Applicant Address: US SC Simpsonville US IL Schaumburg
- Assignee: Kemet Electronics Corporation,Motorola, Inc.
- Current Assignee: Kemet Electronics Corporation,Motorola, Inc.
- Current Assignee Address: US SC Simpsonville US IL Schaumburg
- Agency: Perkins Law Firm, LLC
- Agent Joseph T. Guy
- Main IPC: H01G4/005
- IPC: H01G4/005

Abstract:
A process for forming a laminate with capacitance and the laminate formed thereby. The process includes the steps of providing a substrate and laminating a conductive foil on the substrate wherein the foil has a dielectric. A conductive layer is formed on the dielectric. The conductive foil is treated to electrically isolate a region of conductive foil containing the conductive layer from additional conductive foil. A cathodic conductive couple is made between the conductive layer and a cathode trace and an anodic conductive couple is made between the conductive foil and an anode trace.
Public/Granted literature
- US20100020473A1 SUBSTRATE WITH EMBEDDED PATTERNED CAPACITANCE Public/Granted day:2010-01-28
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