发明授权
- 专利标题: Semiconductor device and method of forming three-dimensional vertically oriented integrated capacitors
- 专利标题(中): 形成三维垂直取向的集成电容器的半导体器件和方法
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申请号: US13421770申请日: 2012-03-15
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公开(公告)号: US08476120B2公开(公告)日: 2013-07-02
- 发明人: Rui Huang , Heap Hoe Kuan , Yaojian Lin , Seng Guan Chow
- 申请人: Rui Huang , Heap Hoe Kuan , Yaojian Lin , Seng Guan Chow
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC, Ltd.
- 当前专利权人: STATS ChipPAC, Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Patent Law Group:Atkins & Associates, P.C.
- 代理商 Robert D. Atkins
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/20 ; H01L21/02 ; H01L23/02 ; H01L23/28
摘要:
A semiconductor device includes conductive pillars disposed vertically over a seed layer, a conformal insulating layer formed over the conductive pillars, and a conformal conductive layer formed over the conformal insulating layer. A first conductive pillar, the conformal insulating layer, and the conformal conductive layer constitute a vertically oriented integrated capacitor. The semiconductor device further includes a semiconductor die or component mounted over the seed layer, an encapsulant deposited over the semiconductor die or component and around the conformal conductive layer, and a first interconnect structure formed over a first side of the encapsulant. The first interconnect structure is electrically connected to a second conductive pillar, and includes an integrated passive device. The semiconductor device further includes a second interconnect structure formed over a second side of the encapsulant opposite the first side of the encapsulant.
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