Invention Grant
- Patent Title: Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
- Patent Title (中): 用于光刻设备的静电夹具的平版印刷设备和方法
-
Application No.: US13020399Application Date: 2011-02-03
-
Publication No.: US08476167B2Publication Date: 2013-07-02
- Inventor: Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
- Applicant: Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L21/311
- IPC: H01L21/311
Abstract:
The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
Public/Granted literature
- US20110126406A1 Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus Public/Granted day:2011-06-02
Information query
IPC分类:
