Invention Grant
US08477288B2 Digital exposure method and digital exposure device for performing the method
有权
用于执行该方法的数字曝光方法和数字曝光装置
- Patent Title: Digital exposure method and digital exposure device for performing the method
- Patent Title (中): 用于执行该方法的数字曝光方法和数字曝光装置
-
Application No.: US12906623Application Date: 2010-10-18
-
Publication No.: US08477288B2Publication Date: 2013-07-02
- Inventor: Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
- Applicant: Sang-Hyun Yun , Hi-Kuk Lee , Sang-Woo Bae , Cha-Dong Kim , Jung-In Park
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR2010-0015114 20100219
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42

Abstract:
A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.
Public/Granted literature
- US20110205508A1 Digital Exposure Method and Digital Exposure Device for Performing the Method Public/Granted day:2011-08-25
Information query