Invention Grant
- Patent Title: Defect inspection apparatus
- Patent Title (中): 缺陷检查装置
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Application No.: US12412776Application Date: 2009-03-27
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Publication No.: US08477302B2Publication Date: 2013-07-02
- Inventor: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
- Applicant: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-085167 20080328
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.
Public/Granted literature
- US20090279081A1 DEFECT INSPECTION APPARATUS Public/Granted day:2009-11-12
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