发明授权
US08482048B2 Metal oxide semiconductor field effect transistor integrating a capacitor
有权
集成电容器的金属氧化物半导体场效应晶体管
- 专利标题: Metal oxide semiconductor field effect transistor integrating a capacitor
- 专利标题(中): 集成电容器的金属氧化物半导体场效应晶体管
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申请号: US12947107申请日: 2010-11-16
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公开(公告)号: US08482048B2公开(公告)日: 2013-07-09
- 发明人: Yan Xun Xue , Anup Bhalla , Hamza Yilmaz , Jun Lu
- 申请人: Yan Xun Xue , Anup Bhalla , Hamza Yilmaz , Jun Lu
- 申请人地址: US CA Sunnyvale
- 专利权人: Alpha & Omega Semiconductor, Inc.
- 当前专利权人: Alpha & Omega Semiconductor, Inc.
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: CH Emily LLC
- 代理商 Chein-Hwa Tsao
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L29/94
摘要:
A bypass capacitor is directly integrated on top of a MOSFET chip. The capacitor comprises multi layers of conductive material and dielectric material staking on top of each other with connection vias through dielectric layer for connecting different conductive layers. The method of integrating the bypass capacitor comprises repeating steps of depositing a dielectric layer, forming connection vias through the dielectric layer, depositing a conductive layer and patterning the conductive layer.
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