Invention Grant
- Patent Title: Method for growth of indium-containing nitride films
- Patent Title (中): 含铟氮化物膜生长方法
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Application No.: US13346507Application Date: 2012-01-09
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Publication No.: US08482104B2Publication Date: 2013-07-09
- Inventor: Mark P. D'Evelyn , Christiane Poblenz , Michael R. Krames
- Applicant: Mark P. D'Evelyn , Christiane Poblenz , Michael R. Krames
- Applicant Address: US CA Fremont
- Assignee: Soraa, Inc.
- Current Assignee: Soraa, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L29/20
- IPC: H01L29/20

Abstract:
A method for growth of indium-containing nitride films is described, particularly a method for fabricating a gallium, indium, and nitrogen containing material. On a substrate having a surface region a material having a first indium-rich concentration is formed, followed by a second thickness of material having a first indium-poor concentration. Then a third thickness of material having a second indium-rich concentration is added to form a sandwiched structure which is thermally processed to cause formation of well-crystallized, relaxed material within a vicinity of a surface region of the sandwich structure.
Public/Granted literature
- US20120199952A1 Method for Growth of Indium-Containing Nitride Films Public/Granted day:2012-08-09
Information query
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