Invention Grant
- Patent Title: Monitoring apparatus and method particularly useful in photolithographically processing substrates
- Patent Title (中): 监控设备和方法特别适用于光刻处理基板
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Application No.: US12911371Application Date: 2010-10-25
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Publication No.: US08482715B2Publication Date: 2013-07-09
- Inventor: Giora Dishon , Moshe Finarov , Zvi Nirel , Yoel Cohen
- Applicant: Giora Dishon , Moshe Finarov , Zvi Nirel , Yoel Cohen
- Applicant Address: IL Rehovot
- Assignee: Nova Measuring Instruments Ltd.
- Current Assignee: Nova Measuring Instruments Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, PLLC
- Priority: IL125337 19980714
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G01B11/00 ; G01N21/00

Abstract:
A system for determining at least two properties of a substrate, including a supporting plate configured to support the substrate, and a measurement device coupled to the supporting plate, including an illumination system configured to direct light toward a surface of the substrate, and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the substrate, wherein the measurement device is configured to generate one or more output signals in response to the detected light, and a control unit coupled to the measurement device and configured to determine a first property and a second property of the substrate from the one or more output signals, wherein the first property comprises a presence of macro defects on the substrate, and wherein the second property comprises overlay misregistration in the substrate.
Public/Granted literature
- US20110037957A1 MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES Public/Granted day:2011-02-17
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