发明授权
- 专利标题： Vaporizing apparatus and film forming apparatus provided with vaporizing apparatus
- 专利标题（中）： 具有蒸发装置的蒸发装置和成膜装置
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申请号： US12601314申请日： 2008-05-15
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公开(公告)号： US08486196B2公开(公告)日： 2013-07-16
- 发明人: Masayuki Toda , Masaki Kusuhara , Masaru Umeda , Mitsuru Fukagawa
- 申请人： Masayuki Toda , Masaki Kusuhara , Masaru Umeda , Mitsuru Fukagawa
- 申请人地址： JP Tokyo JP Yamagata
- 专利权人： Kabushiki Kaisha Watanabe Shoko,Masayuki Toda
- 当前专利权人： Kabushiki Kaisha Watanabe Shoko,Masayuki Toda
- 当前专利权人地址： JP Tokyo JP Yamagata
- 代理机构： Young & Thompson
- 优先权： JP2007-136872 20070523
- 国际申请： PCT/JP2008/058917 WO 20080515
- 国际公布： WO2008/146608 WO 20081204
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; F01M11/03 ; B01D21/24 ; B01D24/38 ; B01D29/88 ; B01D33/70
摘要：
Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.