Invention Grant
US08486495B2 Siloxane removal via silicate formation for lifetime extension of photocatalytic devices
有权
通过硅酸盐形成去除硅氧烷以使光催化装置的寿命延长
- Patent Title: Siloxane removal via silicate formation for lifetime extension of photocatalytic devices
- Patent Title (中): 通过硅酸盐形成去除硅氧烷以使光催化装置的寿命延长
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Application No.: US12688264Application Date: 2010-01-15
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Publication No.: US08486495B2Publication Date: 2013-07-16
- Inventor: Wayde R. Schmidt , Treese Hugener-Campbell , Tania Bhatia
- Applicant: Wayde R. Schmidt , Treese Hugener-Campbell , Tania Bhatia
- Applicant Address: US CT Farmington
- Assignee: Carrier Corporation
- Current Assignee: Carrier Corporation
- Current Assignee Address: US CT Farmington
- Agency: Cantor Colburn LLP
- Main IPC: B05D1/06
- IPC: B05D1/06 ; B05D3/06
Abstract:
A method of forming a photocatalyst device includes depositing a layer of UV photocatalyst and depositing islands of a sequestering agent on a surface of the layer of the UV photocatalyst.
Public/Granted literature
- US20100120610A1 SILOXANE REMOVAL VIA SILICATE FORMATION FOR LIFETIME EXTENSION OF PHOTOCATALYTIC DEVICES Public/Granted day:2010-05-13
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