发明授权
US08486605B2 Positive resist composition and method of forming resist pattern
有权
正型抗蚀剂组合物和形成抗蚀剂图案的方法
- 专利标题： Positive resist composition and method of forming resist pattern
- 专利标题（中）： 正型抗蚀剂组合物和形成抗蚀剂图案的方法
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申请号： US12691561申请日： 2010-01-21
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公开(公告)号： US08486605B2公开(公告)日： 2013-07-16
- 发明人: Masaru Takeshita , Yasuhiro Yoshii , Jiro Yokoya , Hirokuni Saito , Tsuyoshi Nakamura
- 申请人： Masaru Takeshita , Yasuhiro Yoshii , Jiro Yokoya , Hirokuni Saito , Tsuyoshi Nakamura
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Knobbe Martens Olson & Bear LLP
- 优先权： JPP2009-014712 20090126
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/095 ; G03F7/20 ; G03F7/30
摘要：
A positive resist composition including: a base material component (A) which exhibits increased solubility in an alkali developing solution under the action of acid; and an acid generator component (B) which generates acid upon exposure; dissolved in an organic solvent (S), wherein the base material component (A) includes a resin component (A1) having 4 types of specific structural units, and the organic solvent (S) includes from 60 to 99% by weight of an alcohol-based organic solvent (S1) and from 1 to 40% by weight of at least one organic solvent (S2) selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether and cyclohexanone.
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