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发明授权
US08486613B2 Method of manufacturing nano-structure and method of manufacturing a pattern using the method 有权
使用该方法制造纳米结构的方法和制造图案的方法

Method of manufacturing nano-structure and method of manufacturing a pattern using the method
摘要：
According to an example embodiment of the present invention, a photoresist pattern is formed on a base substrate including a neutral layer. A sacrifice structure including a first sacrifice block and a second sacrifice block is formed on the base substrate having the photoresist pattern, and the sacrifice structure is formed from a first thin film including a first block copolymer. Thus, a chemical pattern is formed to form a nano-structure. Therefore, the nano-structure may be easily formed on a substrate having a large size by using a block copolymer, and productivity and manufacturing reliability may be improved.
摘要（中）：

根据本发明的示例性实施例，在包括中性层的基底基板上形成光致抗蚀剂图案。 在具有光致抗蚀剂图案的基底上形成包括第一牺牲块和第二牺牲块的牺牲结构，牺牲结构由包括第一嵌段共聚物的第一薄膜形成。 因此，形成化学图案以形成纳米结构。 因此，可以通过使用嵌段共聚物容易地在具有大尺寸的基板上形成纳米结构，并且可以提高生产率和制造可靠性。

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