发明授权
US08487443B2 Semiconductor structure, manufacturing method of semiconductor structure and semiconductor device 失效
半导体结构,半导体结构和半导体器件的制造方法

  • 专利标题: Semiconductor structure, manufacturing method of semiconductor structure and semiconductor device
  • 专利标题(中): 半导体结构,半导体结构和半导体器件的制造方法
  • 申请号: US13074233
    申请日: 2011-03-29
  • 公开(公告)号: US08487443B2
    公开(公告)日: 2013-07-16
  • 发明人: Shinji Wakisaka
  • 申请人: Shinji Wakisaka
  • 申请人地址: JP Tokyo
  • 专利权人: Teramikros, Inc.
  • 当前专利权人: Teramikros, Inc.
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Holtz, Holtz, Goodman & Chick, PC
  • 优先权: JP2010-075037 20100329
  • 主分类号: H01L23/48
  • IPC分类号: H01L23/48
Semiconductor structure, manufacturing method of semiconductor structure and semiconductor device
摘要:
Disclosed is a semiconductor structure including a semiconductor substrate including an electronic circuit which is provided in a predetermined region of the semiconductor substrate, a wiring provided on the semiconductor substrate in a region outside of the predetermined region, an external connection electrode provided on the wiring, a sealing resin which covers a side surface of the external connection electrode and a wall which intervenes between the electronic circuit and the sealing resin.
信息查询
0/0