发明授权
- 专利标题: Thin-film inspection apparatus and inspection method
- 专利标题(中): 薄膜检验仪器及检验方法
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申请号: US13120319申请日: 2009-07-02
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公开(公告)号: US08497991B2公开(公告)日: 2013-07-30
- 发明人: Satoshi Sakai , Kohei Kawazoe , Kengo Yamaguchi , Akemi Takano
- 申请人: Satoshi Sakai , Kohei Kawazoe , Kengo Yamaguchi , Akemi Takano
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理商 Manabu Kanesaka; Kenneth M. Berner; Benjamin J. Hauptman
- 优先权: JP2009-047359 20090227
- 国际申请: PCT/JP2009/062118 WO 20090702
- 国际公布: WO2010/097971 WO 20100902
- 主分类号: G01N21/47
- IPC分类号: G01N21/47 ; G01N21/00
摘要:
An object is to reduce the effect of a film thickness variation on the substrate surface of a thin film and improve the measuring accuracy. Provided are a light source that radiates single-wavelength light to an inspection-target substrate (W), which is formed by forming a thin film on a glass substrate from the glass substrate side; a light receiving element that is disposed such that the light receiving axis intersects with the optical axis of illumination light emitted from the light source at a predetermined inclination angle and that receives diffused transmitted light that has been transmitted through the inspection-target substrate W; and a computer (7) that obtains a haze ratio of the thin film on the basis of the intensity of the light received by the light receiving element. The computer (7) has a haze ratio characteristic made by associating the haze ratio and the light intensity of the diffused transmitted light and obtains a haze ratio by using the haze ratio characteristic and the light intensity received by the light receiving element.
公开/授权文献
- US20110194113A1 THIN-FILM INSPECTION APPARATUS AND INSPECTION METHOD 公开/授权日:2011-08-11