发明授权
US08501393B2 Anti-reflective coating forming composition containing vinyl ether compound
失效
含有乙烯基醚化合物的抗反射涂层成型组合物
- 专利标题： Anti-reflective coating forming composition containing vinyl ether compound
- 专利标题（中）： 含有乙烯基醚化合物的抗反射涂层成型组合物
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申请号： US11596391申请日： 2005-05-11
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公开(公告)号： US08501393B2公开(公告)日： 2013-08-06
- 发明人: Tadashi Hatanaka , Shigeo Kimura , Tomoyuki Enomoto
- 申请人： Tadashi Hatanaka , Shigeo Kimura , Tomoyuki Enomoto
- 申请人地址： JP Tokyo
- 专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2004-144625 20040514; JP2004-353627 20041207
- 国际申请： PCT/JP2005/008617 WO 20050511
- 国际公布： WO2005/111724 WO 20051124
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/20 ; G03F7/38 ; H01L21/027
摘要：
There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.
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