发明授权
- 专利标题： Adaptive recipe selector
- 专利标题（中）： 自适应配方选择器
-
申请号： US13073237申请日： 2011-03-28
-
公开(公告)号： US08501499B2公开(公告)日： 2013-08-06
- 发明人: Radha Sundararajan , Merritt Funk , Lee Chen , Barton Lane
- 申请人： Radha Sundararajan , Merritt Funk , Lee Chen , Barton Lane
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理商 Manuel Madriaga
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/461 ; H01L21/302
摘要：
The invention provides a method of processing a wafer using Ion Energy (IE)-related multilayer process sequences and Ion Energy Controlled Multi-Input/Multi-Output (IEC-MIMO) models and libraries that can include one or more measurement procedures, one or more IEC-etch sequences, and one or more Ion Energy Optimized (IEO) etch procedures. The IEC-MIMO process control uses dynamically interacting behavioral modeling between multiple layers and/or multiple IEC etch sequences. The multiple layers and/or the multiple IEC etch sequence can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created using IEO etch procedures.
公开/授权文献
- US20120252141A1 Adaptive Recipe Selector 公开/授权日：2012-10-04