发明授权
- 专利标题: Standard cells having flexible layout architecture/boundaries
- 专利标题(中): 具有灵活布局架构/边界的标准单元
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申请号: US12697887申请日: 2010-02-01
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公开(公告)号: US08504972B2公开(公告)日: 2013-08-06
- 发明人: Yung-Chin Hou , David Barry Scott , Lee-Chung Lu , Li-Chun Tien
- 申请人: Yung-Chin Hou , David Barry Scott , Lee-Chung Lu , Li-Chun Tien
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
An integrated circuit layout includes a standard cell, which includes a first gate strip and a second gate strip parallel to each other and having a gate pitch; a first boundary and a second boundary on opposite ends of the first standard cell; and a third boundary and a fourth boundary on opposite ends of the first standard cell and parallel to the first gate strip and the second gate strip. A cell pitch between the third boundary and the fourth boundary is not equal to integer times the gate pitch. A PMOS transistor is formed of the first gate strip and a first active region. An NMOS transistor is formed of the first gate strip and a second active region.
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