发明授权
- 专利标题: Composition for optical materials
- 专利标题(中): 光学材料组成
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申请号: US12904252申请日: 2010-10-14
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公开(公告)号: US08506853B2公开(公告)日: 2013-08-13
- 发明人: Kenji Wada , Kyohei Arayama , Akiyoshi Goto
- 申请人: Kenji Wada , Kyohei Arayama , Akiyoshi Goto
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2009-239462 20091016
- 主分类号: F21V9/04
- IPC分类号: F21V9/04 ; C08F30/08 ; C07F7/00
摘要:
The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.
公开/授权文献
- US20110089385A1 COMPOSITION FOR OPTICAL MATERIALS 公开/授权日:2011-04-21
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