COMPOSITION FOR OPTICAL MATERIALS
    1.
    发明申请
    COMPOSITION FOR OPTICAL MATERIALS 有权
    光学材料组成

    公开(公告)号:US20110089385A1

    公开(公告)日:2011-04-21

    申请号:US12904252

    申请日:2010-10-14

    IPC分类号: G02B5/22 C07F7/18 C07F7/10

    摘要: The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.

    摘要翻译: 用于光学材料的组合物包括由平均组成式(1)表示的倍半硅氧烷获得的聚合物:(R1SiO1.5)x(R2SiO1.5)y(其中R1是可聚合基团,R2是不可聚合基团, x为2.0〜14.0的数,y为2.0〜14.0的数,条件是x + y = 8.0〜16.0,R 1基和R 2基可以相同或不同),并且包括至少一种笼型倍半硅氧烷化合物。 该组合物适合用作光学元件中的抗反射膜,在固化步骤中具有较小的膜收缩率,具有良好的涂覆表面状态和优异的耐湿性和粘附性,在高温条件下的折射率变化小,并且能够 形成低折射率膜。

    Composition for optical materials
    2.
    发明授权
    Composition for optical materials 有权
    光学材料组成

    公开(公告)号:US08506853B2

    公开(公告)日:2013-08-13

    申请号:US12904252

    申请日:2010-10-14

    IPC分类号: F21V9/04 C08F30/08 C07F7/00

    摘要: The composition for optical materials includes a polymer obtained from silsesquioxanes which are represented by average composition formula (1): (R1SiO1.5)x(R2SiO1.5)y (wherein R1 is a polymerizable group, R2 is a non-polymerizable group, x is a number of 2.0 to 14.0, y is a number of 2.0 to 14.0, provided that x+y=8.0 to 16.0, and R1 groups and R2 groups may be the same or different) and include at least one cage silsesquioxane compound. This composition is suitable for use as the antireflective film in optical devices, has less film shrinkage in the curing step, has good coated surface state and excellent moisture resistance and adhesion, has small changes in the refractive index under high temperature conditions, and is capable of forming a low-refractive-index film.

    摘要翻译: 用于光学材料的组合物包括由平均组成式(1)表示的倍半硅氧烷获得的聚合物:(R1SiO1.5)x(R2SiO1.5)y(其中R1是可聚合基团,R2是不可聚合基团, x为2.0〜14.0的数,y为2.0〜14.0的数,条件是x + y = 8.0〜16.0,R 1基和R 2基可以相同或不同),并且包括至少一种笼型倍半硅氧烷化合物。 该组合物适合用作光学元件中的抗反射膜,在固化步骤中具有较小的膜收缩率,具有良好的涂覆表面状态和优异的耐湿性和粘附性,在高温条件下的折射率变化小,并且能够 形成低折射率膜。

    Method of producing acid halide and acid halide
    8.
    发明授权
    Method of producing acid halide and acid halide 有权
    生产酰卤和酰卤的方法

    公开(公告)号:US08729302B2

    公开(公告)日:2014-05-20

    申请号:US13194170

    申请日:2011-07-29

    申请人: Akiyoshi Goto

    发明人: Akiyoshi Goto

    IPC分类号: C07C53/50

    摘要: A method of producing an acid halide, including: reacting a compound represented by the following Formula (III) with a basic compound and a compound represented by the following Formula (IV) to obtain a compound represented by the following Formula (II); and reacting the compound represented by Formula (II) with an acid halogenating agent to obtain a compound represented by the following Formula (I):

    摘要翻译: 一种制备酰卤的方法,包括:使下式(III)表示的化合物与碱式化合物和下式(Ⅳ)表示的化合物反应,得到下式(Ⅱ)表示的化合物。 使式(II)表示的化合物与酸性卤化剂反应,得到下式(I)表示的化合物: