发明授权
- 专利标题： Antireflective compositions and methods of using same
- 专利标题（中）： 抗反射组合物及其使用方法
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申请号： US12708205申请日： 2010-02-18
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公开(公告)号： US08507192B2公开(公告)日： 2013-08-13
- 发明人: Huirong Yao , Guanyang Lin , Jianhui Shan , JoonYeon Cho , Salem K. Mullen
- 申请人： Huirong Yao , Guanyang Lin , Jianhui Shan , JoonYeon Cho , Salem K. Mullen
- 申请人地址： US NJ Somerville
- 专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人地址： US NJ Somerville
- 代理机构： Sangya Jain
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; G03F7/11 ; G03F7/38
摘要：
A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
公开/授权文献
- US20110200938A1 Antireflective Compositions and Methods of Using Same 公开/授权日：2011-08-18
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