发明授权
US08513448B2 Cyclic siloxane compound, a material for forming Si-containing film, and its use
有权
环状硅氧烷化合物，用于形成含Si膜的材料及其用途
- 专利标题： Cyclic siloxane compound, a material for forming Si-containing film, and its use
- 专利标题（中）： 环状硅氧烷化合物，用于形成含Si膜的材料及其用途
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申请号： US11815194申请日： 2006-01-17
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公开(公告)号： US08513448B2公开(公告)日： 2013-08-20
- 发明人: Daiji Hara , Mayumi Takamori
- 申请人： Daiji Hara , Mayumi Takamori
- 申请人地址： JP Yamaguchi
- 专利权人： Tosoh Corporation
- 当前专利权人： Tosoh Corporation
- 当前专利权人地址： JP Yamaguchi
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2005-023256 20050131
- 国际申请： PCT/JP2006/300519 WO 20060117
- 国际公布： WO2006/080205 WO 20060803
- 主分类号： C07F7/00
- IPC分类号： C07F7/00
摘要：
The present invention has the objects to provide a novel material for forming Si-containing film, especially a material containing a cyclic siloxane compound suitable to a PECVD equipment for low dielectric constant insulating film, and to provide an Si-containing film using the same, and a semiconductor device containing those films. The present invention relates to a material for forming Si-containing film, containing a cyclic siloxane compound represented by the following general formula (1) (In the formula, A represents a group containing at least one selected from the group consisting of an oxygen atom, a boron atom and a nitrogen atom, n is 1 or 2, and x is an integer of from 2 to 10.), and its use.
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