发明授权
- 专利标题: Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
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申请号: US12954485申请日: 2010-11-24
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公开(公告)号: US08524095B2公开(公告)日: 2013-09-03
- 发明人: Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
- 申请人: Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
- 申请人地址: NL Amsterdam
- 专利权人: HGST Netherlands B.V.
- 当前专利权人: HGST Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: B44C1/22
- IPC分类号: B44C1/22
摘要:
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
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