发明授权
US08524422B2 Low expansion glass substrate for reflection type mask and method for processing same
有权
用于反射型掩模的低膨胀玻璃基板及其加工方法
- 专利标题： Low expansion glass substrate for reflection type mask and method for processing same
- 专利标题（中）： 用于反射型掩模的低膨胀玻璃基板及其加工方法
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申请号： US13163338申请日： 2011-06-17
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公开(公告)号： US08524422B2公开(公告)日： 2013-09-03
- 发明人: Kenji Okamura , Masabumi Ito , Hiroshi Kojima
- 申请人： Kenji Okamura , Masabumi Ito , Hiroshi Kojima
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JPP2008-320876 20081217
- 主分类号： G03F1/24
- IPC分类号： G03F1/24 ; G03F1/22
摘要：
The present invention relates to a low expansion glass substrate which serves as a substrate of a reflective mask used in a lithography step of semiconductor production steps, wherein two side surfaces positioned to face each other among side surfaces formed along a periphery of the low expansion glass substrate, each have a flatness of 25 μm or less.