发明授权
- 专利标题: Method and apparatus for inspecting sample surface
- 专利标题(中): 检测样品表面的方法和装置
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申请号: US13398112申请日: 2012-02-16
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公开(公告)号: US08525127B2公开(公告)日: 2013-09-03
- 发明人: Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
- 申请人: Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2006-016519 20060125; JP2006-058847 20060306; JP2006-058862 20060306
- 主分类号: G21K5/10
- IPC分类号: G21K5/10
摘要:
Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
公开/授权文献
- US20120145921A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 公开/授权日:2012-06-14
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