发明授权
- 专利标题： Vacuum processing apparatus and operating method for vacuum processing apparatus
- 专利标题（中）： 真空处理装置及真空处理装置的操作方法
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申请号： US12864624申请日： 2008-06-27
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公开(公告)号： US08529704B2公开(公告)日： 2013-09-10
- 发明人: Eishiro Sasakawa , Masahiro Sakaki , Shigekazu Ueno , Keisuke Kawamura , Akemi Takano
- 申请人： Eishiro Sasakawa , Masahiro Sakaki , Shigekazu Ueno , Keisuke Kawamura , Akemi Takano
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Heavy Industries, Ltd.
- 当前专利权人： Mitsubishi Heavy Industries, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理商 Manabu Kanesaka; Kenneth M. Berner; Benjamin J. Hauptman
- 国际申请： PCT/JP2008/061728 WO 20080627
- 国际公布： WO2009/157084 WO 20091230
- 主分类号： B08B5/04
- IPC分类号： B08B5/04
摘要：
An operation method for cleaning a vacuum processing apparatus includes feeding a cleaning gas into a film deposition chamber of the vacuum processing apparatus when a predetermined number of batches of film deposition process is finished. The predetermined number of batch of film deposition processes is calculated based on a film deposition-related operating time (a film deposition time and a film deposition preparation time) and a cleaning-related operating time (a cleaning procedure time, a cleaning procedure preparation time, and a pre-deposition film deposition time).
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