发明授权
- 专利标题： Large area patterning of nano-sized shapes
- 专利标题（中）： 纳米尺寸形状的大面积图案
-
申请号： US12616896申请日： 2009-11-12
-
公开(公告)号： US08529778B2公开(公告)日： 2013-09-10
- 发明人: Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
- 申请人： Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
- 申请人地址： US TX Austin US TX Austin
- 专利权人： Molecular Imprints, Inc.,Board of Regents, The University of Texas System
- 当前专利权人： Molecular Imprints, Inc.,Board of Regents, The University of Texas System
- 当前专利权人地址： US TX Austin US TX Austin
- 代理商 Cameron A. King
- 主分类号： B44C1/22
- IPC分类号： B44C1/22
摘要：
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
公开/授权文献
- US20100120251A1 Large Area Patterning of Nano-Sized Shapes 公开/授权日：2010-05-13
信息查询
