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    Functional nanoparticles
    1.
    发明授权
    Functional nanoparticles 有权
    功能性纳米粒子

    公开(公告)号：US08961800B2

    公开(公告)日：2015-02-24

    申请号：US12854359

    申请日：2010-08-11

    Applicant: Sidlgata V. Sreenivasan ,  Shuqiang Yang ,  Frank Y. Xu ,  Vikramjit Singh

    Inventor： Sidlgata V. Sreenivasan ,  Shuqiang Yang ,  Frank Y. Xu ,  Vikramjit Singh

    IPC: B44C1/22 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B82Y30/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00

    Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.

    Abstract translation: 可以使用至少一个纳米光刻步骤形成功能性纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻系统在多层衬底上图案化。 该图案可以进一步蚀刻到多层基板中。 然后将功能材料沉积在多层基底上并固化。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 支柱可以从多层底物形成功能纳米颗粒中去除。

    Functional Nanoparticles
    2.
    发明申请
    Functional Nanoparticles 有权
    功能纳米粒子

    公开(公告)号：US20110049096A1

    公开(公告)日：2011-03-03

    申请号：US12854359

    申请日：2010-08-11

    Applicant: Sidlgata V. Sreenivasan ,  Shuqiang Yang ,  Frank Y. Xu ,  Vikramjit Singh

    Inventor： Sidlgata V. Sreenivasan ,  Shuqiang Yang ,  Frank Y. Xu ,  Vikramjit Singh

    IPC: B29C59/16 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00

    Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.

    Abstract translation: 可以使用至少一个纳米光刻步骤形成功能纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻系统在多层衬底上图案化。 该图案可以进一步蚀刻到多层基板中。 然后将功能材料沉积在多层基底上并固化。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 支柱可以从多层底物形成功能纳米颗粒中去除。

    SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY
    5.
    发明申请
    SOLAR CELL FABRICATION BY NANOIMPRINT LITHOGRAPHY 审中-公开
    太阳能电池制造NANOIMPRINT LITHOGRAPHY

    公开(公告)号：US20110180127A1

    公开(公告)日：2011-07-28

    申请号：US13016006

    申请日：2011-01-28

    Applicant: Fen Wan ,  Shuqiang Yang ,  Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Michael N. Miller ,  Darren D. Donaldson

    Inventor： Fen Wan ,  Shuqiang Yang ,  Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Michael N. Miller ,  Darren D. Donaldson

    IPC: H01L31/02 ,  H01L31/0232

    CPC classification number: H01L51/4213 ,  B82Y10/00 ,  H01L51/0017 ,  H01L51/0037 ,  H01L51/0047 ,  H01L51/442 ,  H01L51/447 ,  Y02E10/549

    Abstract: Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.

    Abstract translation: 制造太阳能电池堆包括在硅晶片的第一表面上形成纳米图案的聚合物层并蚀刻硅晶片的第一表面以将纳米图案化的聚合物层的图案转移到硅晶片的第一表面。 在硅晶片的第二表面上形成反射电极材料层。 硅晶片的纳米图案化的第一表面经历缓冲氧化物蚀刻。 在缓冲氧化物蚀刻之后，处理硅晶片的纳米图案化的第一表面以降低纳米图案化的第一表面上的水的接触角。 电子给体材料沉积在硅晶片的纳米图案化的第一表面上以形成电子供体层，并且在电子给体层上沉积透明电极材料，以在电子给体层上形成透明电极层。

    Nanoimprint lithography processes for forming nanoparticles
    8.
    发明授权
    Nanoimprint lithography processes for forming nanoparticles 有权
    用于形成纳米颗粒的纳米压印光刻工艺

    公开(公告)号：US08802747B2

    公开(公告)日：2014-08-12

    申请号：US13017259

    申请日：2011-01-31

    Applicant: Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    Inventor： Frank Y. Xu ,  Sidlgata V. Sreenivasan ,  Shuqiang Yang

    IPC: B29D11/00 ,  C08F20/06 ,  B23P15/00 ,  B29C35/08

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.

    Abstract translation: 用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。 在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。 然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。 在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。 去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

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