- 专利标题: Method of large-area circuit layout recognition
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申请号: US13530605申请日: 2012-06-22
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公开(公告)号: US08530337B1公开(公告)日: 2013-09-10
- 发明人: Stephen W. Bedell , Bahman Hekmatshoartabari , Ali Khakifirooz , John A. Ott , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人: Stephen W. Bedell , Bahman Hekmatshoartabari , Ali Khakifirooz , John A. Ott , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 代理商 Louis J. Percello, Esq.
- 主分类号: H01L21/304
- IPC分类号: H01L21/304
摘要:
Methods for detecting the physical layout of an integrated circuit are provided. The methods of the present disclosure allow large area imaging of the circuit layout without requiring tedious sample preparation techniques. The imaging can be performed utilizing low-energy beam techniques such as scanning electron microscopy; however, more sophisticated imaging techniques can also be employed. In the methods of the present disclosure, spalling is used to remove a portion of a semiconductor layer including at least one semiconductor device formed thereon or therein from a base substrate. In some cases, a buried insulator layer that is located beneath a semiconductor layer including the at least one semiconductor device can be completely or partially removed. In some cases, the semiconductor layer including the at least one semiconductor device can be thinned. The methods improve the detection quality that the buried insulator layer and a thick semiconductor layer can reduce.
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