发明授权
- 专利标题： Substrates of N-end rule ubiquitylation and methods for measuring the ubiquitylation of these substrate
- 专利标题（中）： N端规则泛素化的底物和测量这些底物的泛素化的方法
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申请号： US12606787申请日： 2009-10-27
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公开(公告)号： US08530408B2公开(公告)日： 2013-09-10
- 发明人: Ilia Davydov , John H. Kenten , Hans Biebuyck , Pankaj Oberoi
- 申请人： Ilia Davydov , John H. Kenten , Hans Biebuyck , Pankaj Oberoi
- 申请人地址： US MD Gaithersburg
- 专利权人： Meso Scale Technologies LLC
- 当前专利权人： Meso Scale Technologies LLC
- 当前专利权人地址： US MD Gaithersburg
- 代理机构： Nixon Vanderhye PC
- 主分类号： C07K14/00
- IPC分类号： C07K14/00
摘要：
The present invention relates to methods, compositions, compounds and kits for detecting, measuring and modulating protein ubiquitylation via the N-end rule pathway and for identifying novel substrates, enzymes and modulators of N-end rule ubiquitylation. The present invention also relates to specific substrates of N-end rule ubiquitylation as well as activated fragments of these substrates, proteases that expose N-degrons in these substrates, ubiquitin ligases that ubiquitylate these substrates and inhibitors of the ubiquitylation of these substrates.
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