Invention Grant
US08541093B2 Method for high resolution ink-jet print using pre-patterned substrate and conductive substrate manufactured using the same
有权
使用预先图案化的衬底和使用其制造的导电衬底的高分辨率喷墨打印方法
- Patent Title: Method for high resolution ink-jet print using pre-patterned substrate and conductive substrate manufactured using the same
- Patent Title (中): 使用预先图案化的衬底和使用其制造的导电衬底的高分辨率喷墨打印方法
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Application No.: US13354159Application Date: 2012-01-19
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Publication No.: US08541093B2Publication Date: 2013-09-24
- Inventor: Tae-Su Kim , Jae-Jin Kim , Bu-Gon Shin , Duk-Sik Ha , Jung-Ho Park
- Applicant: Tae-Su Kim , Jae-Jin Kim , Bu-Gon Shin , Duk-Sik Ha , Jung-Ho Park
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, LLP
- Priority: KR10-2006-0122217 20061205
- Main IPC: G02F1/1335
- IPC: G02F1/1335

Abstract:
A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d
Public/Granted literature
Information query
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