SUBSTRATE HAVING LOW REFLECTION AND HIGH CONTACT ANGLE, AND PRODUCTION METHOD FOR SAME
    6.
    发明申请
    SUBSTRATE HAVING LOW REFLECTION AND HIGH CONTACT ANGLE, AND PRODUCTION METHOD FOR SAME 有权
    具有低反射和高接触角的基底及其生产方法

    公开(公告)号:US20120212816A1

    公开(公告)日:2012-08-23

    申请号:US13504444

    申请日:2010-10-28

    摘要: Provided are a substrate including a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on at least one side with the pattern of the base, an optical product including the same, and a manufacturing method of the substrate. The substrate according to the present invention has both an excellent anti-reflective property and an excellent water repellent property.

    摘要翻译: 提供了一种基板,其包括在其至少一个侧面上具有图案的基底,其中图案的下部区域中的折射率和图案的上部区域中的折射率彼此不同, 模式; 以及在至少一侧设置有基底的图案的防水涂层,包括该基板的图案的光学产品和基板的制造方法。 根据本发明的基材具有优异的抗反射性和优异的防水性。

    Substrate having low reflection and high contact angle, and production method for same
    7.
    发明授权
    Substrate having low reflection and high contact angle, and production method for same 有权
    具有低反射和高接触角的基板及其制造方法

    公开(公告)号:US09081134B2

    公开(公告)日:2015-07-14

    申请号:US13504444

    申请日:2010-10-28

    IPC分类号: G02B5/30 G02B1/118 G02B1/10

    摘要: Provided are a substrate including a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on at least one side with the pattern of the base, an optical product including the same, and a manufacturing method of the substrate. The substrate according to the present invention has both an excellent anti-reflective property and an excellent water repellent property.

    摘要翻译: 提供了一种基板,其包括在其至少一个侧面上具有图案的基底,其中图案的下部区域中的折射率和图案的上部区域中的折射率彼此不同, 模式; 以及在至少一侧设置有基底的图案的防水涂层,包括该基板的图案的光学产品和基板的制造方法。 根据本发明的基材具有优异的抗反射性和优异的防水性。

    PRIVACY FILTER AND PREPARATION METHOD THEREOF
    8.
    发明申请
    PRIVACY FILTER AND PREPARATION METHOD THEREOF 有权
    隐私筛选及其制备方法

    公开(公告)号:US20130050798A1

    公开(公告)日:2013-02-28

    申请号:US13642351

    申请日:2011-04-22

    摘要: The present invention relates to a privacy filter and its preparation method and, more particularly to a privacy filter and its preparation method in which the privacy filter comprises: a first transparent substrate; a second transparent substrate positioned a predetermined distance apart from and opposite to the first transparent substrate; an electrolyte filled between the first and second transparent substrates; and a second transparent conductive layer disposed between the electrolyte and the second transparent substrate. The first transparent substrate comprises: an uneven pattern having a wire grid and trenches formed on the first transparent substrate; a first transparent conductive layer formed on the wire grid and the trenches of the uneven pattern; and an electrochromic layer being formed on the first transparent conductive layer along the sidewall of the wire grid and containing an electrochromic material to transmit or absorb visible light depending on whether an electrical signal is applied or not.The privacy filter of the present invention can effectively block the lateral transmission of light without a loss of the front transmittance in the private mode, achieve a fast switching between wide field mode and narrow field mode, and secure excellences in filter performance and driving stability.

    摘要翻译: 隐私过滤器及其制备方法技术领域本发明涉及一种隐私过滤器及其制备方法,更具体地涉及一种隐私过滤器及其制备方法,其中所述隐私过滤器包括:第一透明衬底; 第二透明基板,其与第一透明基板隔开并相对定位; 填充在第一和第二透明基板之间的电解质; 以及设置在电解质和第二透明基板之间的第二透明导电层。 第一透明基板包括:具有线栅的不均匀图案和形成在第一透明基板上的沟槽; 形成在线栅上的第一透明导电层和不均匀图案的沟槽; 以及电致变色层,其沿着所述导线栅格的侧壁形成在所述第一透明导电层上,并且根据是否施加电信号而含有电致变色材料以透射或吸收可见光。 本发明的隐私滤波器可以有效地阻止光的横向传输,而不会在私有模式下损失正面透射率,实现宽场模式和窄场模式之间的快速切换,并且保证了滤波器性能和驱动稳定性。

    Privacy filter comprising a wire grid
    9.
    发明授权
    Privacy filter comprising a wire grid 有权
    隐私过滤器,包括线栅

    公开(公告)号:US09459472B2

    公开(公告)日:2016-10-04

    申请号:US13642351

    申请日:2011-04-22

    IPC分类号: G02F1/153 G02F1/13

    摘要: A privacy filter and its preparation method are disclosed. One embodiment of the privacy filter comprises: a first transparent substrate; a second transparent substrate positioned a predetermined distance apart from and opposite to the first transparent substrate; an electrolyte filled between the first and second transparent substrates; and a second transparent conductive layer disposed between the electrolyte and the second transparent substrate. The first transparent substrate comprises: an uneven pattern having a wire grid and trenches formed on the first transparent substrate; a first transparent conductive layer formed on the wire grid and the trenches of the uneven pattern; and an electrochromic layer being formed on the first transparent conductive layer along the sidewall of the wire grid and containing an electrochromic material to transmit or absorb visible light depending on whether an electrical signal is applied or not.

    摘要翻译: 公开了一种隐私过滤器及其制备方法。 隐私过滤器的一个实施例包括:第一透明衬底; 第二透明基板,其与第一透明基板隔开并相对定位; 填充在第一和第二透明基板之间的电解质; 以及设置在电解质和第二透明基板之间的第二透明导电层。 第一透明基板包括:具有线栅的不均匀图案和形成在第一透明基板上的沟槽; 形成在线栅上的第一透明导电层和不均匀图案的沟槽; 以及电致变色层,其沿着所述导线栅格的侧壁形成在所述第一透明导电层上,并且根据是否施加电信号而含有电致变色材料以透射或吸收可见光。

    Method for laser interference lithography using diffraction grating
    10.
    发明授权
    Method for laser interference lithography using diffraction grating 有权
    使用衍射光栅的激光干涉光刻方法

    公开(公告)号:US08399184B2

    公开(公告)日:2013-03-19

    申请号:US12738598

    申请日:2008-10-08

    IPC分类号: G03F7/20

    摘要: A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.

    摘要翻译: 使用衍射光栅的激光干涉光刻方法包括:(a)在要形成重复精细图案的工件基板上形成光致抗蚀剂层; (b)在光致抗蚀剂层上形成折射率匹配材料层; (c)在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层(λ为激光束的波长,ng为衍射光栅的折射率 ,n0是空气中或真空中的折射率); 和(d)通过垂直于衍射光栅层输入激光束,通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。 该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。