Invention Grant
- Patent Title: Die edge contacts for semiconductor devices
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Application No.: US12874816Application Date: 2010-09-02
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Publication No.: US08541262B2Publication Date: 2013-09-24
- Inventor: Yi-Jen Lai , You-Hua Chou , Hon-Lin Huang , Huai-Tei Yang
- Applicant: Yi-Jen Lai , You-Hua Chou , Hon-Lin Huang , Huai-Tei Yang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L23/50
- IPC: H01L23/50

Abstract:
A semiconductor device utilizing die edge contacts is provided. An integrated circuit die has a post-passivation layer with a trench filled with a conductive material extending from a contact to a die edge, thereby forming a die edge contact. Optionally, a through substrate via may be positioned along the die edge such that the conductive material in the trench is electrically coupled to the through-substrate via, thereby forming a larger die edge contact. The integrated circuit die may be placed in a multi-die package wherein the multi-die package includes walls having a major surface perpendicular to a major surface of the integrated circuit die. The die edge contacts are electrically coupled to contacts on the walls of the multi-die package. The multi-die package may include edge contacts for connecting to another substrate, such as a printed circuit board, a packaging substrate, a high-density interconnect, or the like.
Public/Granted literature
- US20120056328A1 Die Edge Contacts for Semiconductor Devices Public/Granted day:2012-03-08
Information query
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